Wednesday, March 23, 2011

NPTEL Online-IIT BOMBAY

NPTEL Online-IIT BOMBAY


3.3 Layer Representations
With increase of complexity in the CMOS processes, the visualization of all the mask levels that are used in the actual fabrication process becomes inhibited. The layer concept translates these masks to a set of conceptual layout levels that are
easier to visualize by the circuit designer. From the designer's viewpoint, all CMOS designs have the following entities:

Two different substrates and/or wells: which are p-type for NMOS and n-type for PMOS.

Diffusion regions (p+ and n+): which defines the area where transistors can be formed. These regions are also called active areas. Diffusion of an inverse type is needed to implement contacts to the well or to substrate. These are called select regions.

Transistor gate electrodes : Polysilicon layer

Metal interconnect layers

Interlayer contacts and via layers.


The layers for typical CMOS processes are represented in various figures in terms of:
A color scheme (Mead-Conway colors).
Other color schemes designed to
differentiate CMOS structures.
Varying stipple patterns
Varying line styles

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